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JTAP-01.10.2023

Journal of Theoretical and Applied Physics (JTAP)

Editor-in-Chief: Davoud Dorranian, PhD

Online ISSN: 2251-7235

Print ISSN: 2251-7227

Publishes Bimonthly

Original Article
Experimental investigation on food decontamination by low-temperature dielectric barrier discharge (LT-DBD) plasma: application to bread-born mold

The microbial inactivation ability of low temperature plasma treatment generated by dielectric barrier discharge (DBD) on bread-born mold (black bread mold) is investigated. It is shown that the plasma treatment can effectively decrease the mold growth rate. The longer plasma treatment time is, the more mold spores are inactivated. On the other hand, plasma treatment […]

182432
Original Article
Enhancing Cell Growth with PAN/PVA-Gelatin 3D Scaffold using In-situ UV Radiation Electrospinning and Plasma Treatment

  The hydrophobic nature of synthetic polymers poses a substantial barrier since it limits cell-seeding and proliferation scaffold performance. To overcome this challenge, the present research attempts to employ in-situ UV electrospinning and plasma surface modification techniques to fabricate a three-dimensional PAN/PVA-gelatin scaffold. The proposed scaffold holds great potential in mitigating hydrophobicity limitations, thereby facilitating […]

JTAP-182447
Effect of plasma oxidation parameters on physical properties of nanocrystalline nickel oxide thin films grown by two-step method: DC sputtering and plasma oxidation

AbstractNanocrystalline nickel oxide (NiO) thin films were successfully grown on quartz substrates by two-step method. In the first step, nickel films were deposited on quartz substrates by DC magnetron sputtering technique. Then, the plasma oxidation of nickel films was used for preparation of nickel oxide. The effect of DC plasma power and treatment time on […]