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<ArticleSet>
		<Article>
		<Journal>
			<PublisherName>Journal of Theoretical and Applied Physics (JTAP)</PublisherName>
			<JournalTitle>The experimental approach into the influence of external inductance on the discharge characteristic of HiPIMS</JournalTitle>
			<Issn></Issn>
			<Volume>Volume 13, 2019</Volume>
			<Issue>Issue 4, November and December 2019</Issue>
			<PubDate PubStatus="epublish">
                <Year>2023</Year>
                <Month>11</Month>
                <Day>17</Day>
			</PubDate>
		</Journal>
		<ArticleTitle>The experimental approach into the influence of external inductance on the discharge characteristic of HiPIMS</ArticleTitle>
		<VernacularTitle></VernacularTitle>
		<FirstPage></FirstPage>
		<LastPage></LastPage>
		<ELocationID EIdType="doi">10.1007/s40094-019-00347-3</ELocationID>
		<Language>EN</Language>
		<AuthorList>
            			<Author>
                				<FirstName>Saeed</FirstName>
				<LastName>Ghasemi</LastName>
				<Affiliation>Laser and Plasma Research Institute, Shahid Beheshti University, Evin, Tehran 1983963113, Iran</Affiliation>
				<Identifier Source="ORCID"></Identifier>
			</Author>
            			<Author>
                				<FirstName>Pourya</FirstName>
				<LastName>Seyfi</LastName>
				<Affiliation>Laser and Plasma Research Institute, Shahid Beheshti University, Evin, Tehran 1983963113, Iran</Affiliation>
				<Identifier Source="ORCID"></Identifier>
			</Author>
            			<Author>
                				<FirstName>Alireza</FirstName>
				<LastName>Farhadizadeh</LastName>
				<Affiliation>Laser and Plasma Research Institute, Shahid Beheshti University, Evin, Tehran 1983963113, Iran</Affiliation>
				<Identifier Source="ORCID"></Identifier>
			</Author>
            			<Author>
                				<FirstName>Hamid</FirstName>
				<LastName>Ghomi</LastName>
				<Affiliation>Laser and Plasma Research Institute, Shahid Beheshti University, Tehran, Iran</Affiliation>
				<Identifier Source="ORCID">0000-0003-2203-5194</Identifier>
			</Author>
            		</AuthorList>
		<PublicationType>Journal Article</PublicationType>
		<History>
			<PubDate PubStatus="received">
				<Year>2023</Year>
				<Month>11</Month>
				<Day>17</Day>
			</PubDate>
		</History>
		<Abstract>AbstractThe main objective of the current paper is to describe the effect of external inductance (EI) on the current discharge waveforms of HiPIMS at different pulse-on time (Pon) and its relation with static deposition rate and topographical properties of deposited titanium thin films, which is investigated by scanning electron microscope and atomic force microscope. It has shown that the higher the EI, independent of the Pon, the higher the peak power is. The delay time also extensively increases when an EI is implemented into the circuit. However, the rise time does not have a linear dependency with the EI and its behavior changes to some extent at different Pon. By increasing the EI from zero to 30 mH at Pon = 60 μs, the peak power subsequently rises from 11 to 32 kW at constant time-average power. Meanwhile, the deposition rate decreases from 8.5 to 1.5 nm/min, which is mainly attributed to the metal ions return to the target surface and nonlinear dependency of sputtering yield with applied voltage. It was also revealed that the higher peak power has no special effect on the surface roughness of titanium thin films deposited by HiPIMS.</Abstract>
		<ObjectList>
            			<Object Type="keyword">
				<Param Name="value">Deposition rate</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">External inductance</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">HiPIMS</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">Surface roughness</Param>
			</Object>
					</ObjectList>
	</Article>
		<Article>
		<Journal>
			<PublisherName>Journal of Theoretical and Applied Physics (JTAP)</PublisherName>
			<JournalTitle>Memory effect in silicon nitride deposition using ICPCVD technique</JournalTitle>
			<Issn></Issn>
			<Volume>Volume 13, 2019</Volume>
			<Issue>Issue 4, November and December 2019</Issue>
			<PubDate PubStatus="epublish">
                <Year>2023</Year>
                <Month>11</Month>
                <Day>17</Day>
			</PubDate>
		</Journal>
		<ArticleTitle>Memory effect in silicon nitride deposition using ICPCVD technique</ArticleTitle>
		<VernacularTitle></VernacularTitle>
		<FirstPage></FirstPage>
		<LastPage></LastPage>
		<ELocationID EIdType="doi">10.1007/s40094-019-00354-4</ELocationID>
		<Language>EN</Language>
		<AuthorList>
            			<Author>
                				<FirstName>Sunil</FirstName>
				<LastName>Kumar</LastName>
				<Affiliation>Solid State Physics Laboratory, Delhi, India</Affiliation>
				<Identifier Source="ORCID"></Identifier>
			</Author>
            			<Author>
                				<FirstName>D.</FirstName>
				<LastName>S. Rawal</LastName>
				<Affiliation>Solid State Physics Laboratory, Delhi, India</Affiliation>
				<Identifier Source="ORCID"></Identifier>
			</Author>
            			<Author>
                				<FirstName>Hitendra</FirstName>
				<LastName>K Malik</LastName>
				<Affiliation>Plasma Waves and Particle Acceleration Laboratory, Department of Physics, Indian Institute of Technology Delhi, New Delhi, India</Affiliation>
				<Identifier Source="ORCID">0000-0002-9432-8140</Identifier>
			</Author>
            			<Author>
                				<FirstName>Rajeev</FirstName>
				<LastName>Sanwal</LastName>
				<Affiliation>Solid State Physics Laboratory, Delhi, India</Affiliation>
				<Identifier Source="ORCID"></Identifier>
			</Author>
            			<Author>
                				<FirstName>S.</FirstName>
				<LastName>A. Khan</LastName>
				<Affiliation>Interstate University Accelerator Center, Delhi, India</Affiliation>
				<Identifier Source="ORCID"></Identifier>
			</Author>
            			<Author>
                				<FirstName>Seema</FirstName>
				<LastName>Vinayak</LastName>
				<Affiliation>Solid State Physics Laboratory, Delhi, India</Affiliation>
				<Identifier Source="ORCID"></Identifier>
			</Author>
            		</AuthorList>
		<PublicationType>Journal Article</PublicationType>
		<History>
			<PubDate PubStatus="received">
				<Year>2023</Year>
				<Month>11</Month>
				<Day>17</Day>
			</PubDate>
		</History>
		<Abstract>AbstractIn this study, a plasma-based low-temperature, low-pressure SiN film deposition is investigated for device applications. Ammonia, nitrogen and silane are being used for optimization of the quality of SiN film for device passivation by ICPCVD. Characterization of SiN film is done using elastic recoil detection analysis, AFM, FTIR and ellipsometry. The effect of previous process parameters on subsequent process is called memory effect, which has been investigated by all the characterization techniques. During deposition, this effect has been observed for the same parameters that are used to maintain the stoichiometry of the film. It has been observed that some of the residues of gases used for SiN deposition remain present even after the deposition in the chamber and are carried over for the next deposition process and alter the film property, though parameters such as flow rate, temperature, pressure and time remain fixed. This memory effect alters the film surface roughness and stoichiometry thus affecting device characteristics after passivation.</Abstract>
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				<Param Name="value">Current collapse</Param>
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						<Object Type="keyword">
				<Param Name="value">ERDA</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">HEMT</Param>
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						<Object Type="keyword">
				<Param Name="value">ICPCVD</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">Silicon Nitride (SiN)</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">PECVD</Param>
			</Object>
					</ObjectList>
	</Article>
		<Article>
		<Journal>
			<PublisherName>Journal of Theoretical and Applied Physics (JTAP)</PublisherName>
			<JournalTitle>Detection of overtone and combined peaks using Mn/Cu helical star-shaped (pine-tree-like) sculptured thin films in surface-enhanced Raman spectroscopy</JournalTitle>
			<Issn></Issn>
			<Volume>Volume 13, 2019</Volume>
			<Issue>Issue 4, November and December 2019</Issue>
			<PubDate PubStatus="epublish">
                <Year>2023</Year>
                <Month>11</Month>
                <Day>17</Day>
			</PubDate>
		</Journal>
		<ArticleTitle>Detection of overtone and combined peaks using Mn/Cu helical star-shaped (pine-tree-like) sculptured thin films in surface-enhanced Raman spectroscopy</ArticleTitle>
		<VernacularTitle></VernacularTitle>
		<FirstPage></FirstPage>
		<LastPage></LastPage>
		<ELocationID EIdType="doi">10.1007/s40094-019-00348-2</ELocationID>
		<Language>EN</Language>
		<AuthorList>
            			<Author>
                				<FirstName>Reza</FirstName>
				<LastName>Babaei</LastName>
				<Affiliation>Plasma Physics Research Center, Science and Research Branch, Islamic Azad University, Tehran, Iran</Affiliation>
				<Identifier Source="ORCID"></Identifier>
			</Author>
            			<Author>
                				<FirstName>Shokoofe</FirstName>
				<LastName>Goli‑Haghighi</LastName>
				<Affiliation>School of Physics, College of Science, University of Tehran, Tehran, Iran</Affiliation>
				<Identifier Source="ORCID"></Identifier>
			</Author>
            			<Author>
                				<FirstName>Hadi</FirstName>
				<LastName>Savaloni</LastName>
				<Affiliation>School of Physics, College of Science, University of Tehran, North‑Kargar Street, Tehran, Iran</Affiliation>
				<Identifier Source="ORCID">0000-0002-6836-106X</Identifier>
			</Author>
            		</AuthorList>
		<PublicationType>Journal Article</PublicationType>
		<History>
			<PubDate PubStatus="received">
				<Year>2023</Year>
				<Month>11</Month>
				<Day>17</Day>
			</PubDate>
		</History>
		<Abstract>AbstractMn helical star-shaped (pine-tree-like) nano-sculptured thin films with three-, four-and fivefold symmetry on copper substrates were produced using oblique angle deposition method in conjunction with rotation of sample holder at certain angles. Raman spectroscopy of the samples which were subjected to impregnation by 4,4′-bipyridine (C10H8N2) solution was carried out by 632.8 nm wavelength laser. The analysis of the Raman spectra showed enhancement for the 4,4′-bipyridine main bands (1592 and 1297 cm−1) belonging to the C=C stretching mode, aromatic ring stretching ring and in-plane ring mode of 4,4′-bipyridine, same as results obtained for Ag nano-structures. In addition, overtone and combined peaks are detected that may be related to the particular sculptured structure of the thin films fabricated in this work and the laser wavelength used for Raman spectroscopy. UV–Vis (absorption mode) spectra showed consistent observations with the SERS results leading to important role of surface electromagnetic selection rule in intensification of SERS, in addition pointing out the importance of the effect of the size of hot spots on the frequency of the localized surface plasmonic oscillations.</Abstract>
		<ObjectList>
            			<Object Type="keyword">
				<Param Name="value">Mn helical star shape (pine</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">Surface</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">Surface plasmonic oscillations</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">Tree</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">Sculptured thin films</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">Bipyridine</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">Enhanced Raman spectroscopy</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">Like)</Param>
			</Object>
					</ObjectList>
	</Article>
		<Article>
		<Journal>
			<PublisherName>Journal of Theoretical and Applied Physics (JTAP)</PublisherName>
			<JournalTitle>Investigation of dopant centres dominating the conduction process in the bulk of un-doped GaSb</JournalTitle>
			<Issn></Issn>
			<Volume>Volume 13, 2019</Volume>
			<Issue>Issue 4, November and December 2019</Issue>
			<PubDate PubStatus="epublish">
                <Year>2023</Year>
                <Month>11</Month>
                <Day>17</Day>
			</PubDate>
		</Journal>
		<ArticleTitle>Investigation of dopant centres dominating the conduction process in the bulk of un-doped GaSb</ArticleTitle>
		<VernacularTitle></VernacularTitle>
		<FirstPage></FirstPage>
		<LastPage></LastPage>
		<ELocationID EIdType="doi">10.1007/s40094-019-00355-3</ELocationID>
		<Language>EN</Language>
		<AuthorList>
            			<Author>
                				<FirstName>Megersa</FirstName>
				<LastName>Wodajo Shura</LastName>
				<Affiliation>Department of Applied Physics, Adama Science and Technology University (ASTU), P. O. Box 1888, Adama, Ethiopia</Affiliation>
				<Identifier Source="ORCID">0000-0001-7800-0789</Identifier>
			</Author>
            		</AuthorList>
		<PublicationType>Journal Article</PublicationType>
		<History>
			<PubDate PubStatus="received">
				<Year>2023</Year>
				<Month>11</Month>
				<Day>17</Day>
			</PubDate>
		</History>
		<Abstract>AbstractIn this paper, first, the theoretical description of the effects of the dopant densities and the activation energies on the ionization densities, the chemical potentials corresponding to each dopant levels, the majority carrier densities and the Fermi-energy levels in one-acceptor-level system, highly compensated system and two-acceptor-level system are described in detail. Upon fitting the theoretical to the experimental results obtained by the temperature-dependent Hall effect measurements for three samples of un-doped GaSb, the dopant densities and the activation energies for a system with different dopants are investigated. The obtained results revealed that the dopant activation energy has less (no) effect on the Fermi-energy level and the majority carrier density in the highest temperature regimes. The doping density has also less (no) effect on the Fermi-energy level in the lowest temperature regimes. Finally, fitting of the theoretical to the experimental Hall effect measurements results confirmed the presence of three acceptor and one donor levels dominating the majority carrier densities at different temperature regions in all the samples of un-doped GaSb semiconductor.</Abstract>
		<ObjectList>
            			<Object Type="keyword">
				<Param Name="value">Activation energy</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">Chemical potential</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">Dopant density</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">Ionization density</Param>
			</Object>
					</ObjectList>
	</Article>
		<Article>
		<Journal>
			<PublisherName>Journal of Theoretical and Applied Physics (JTAP)</PublisherName>
			<JournalTitle>Effects of different gas flow rates and non-perpendicular incidence angles of argon cold atmospheric-pressure plasma jet on silver thin film treatment</JournalTitle>
			<Issn></Issn>
			<Volume>Volume 13, 2019</Volume>
			<Issue>Issue 4, November and December 2019</Issue>
			<PubDate PubStatus="epublish">
                <Year>2023</Year>
                <Month>11</Month>
                <Day>17</Day>
			</PubDate>
		</Journal>
		<ArticleTitle>Effects of different gas flow rates and non-perpendicular incidence angles of argon cold atmospheric-pressure plasma jet on silver thin film treatment</ArticleTitle>
		<VernacularTitle></VernacularTitle>
		<FirstPage></FirstPage>
		<LastPage></LastPage>
		<ELocationID EIdType="doi">10.1007/s40094-019-00351-7</ELocationID>
		<Language>EN</Language>
		<AuthorList>
            			<Author>
                				<FirstName>Maryam</FirstName>
				<LastName>Hosseinpour</LastName>
				<Affiliation>Department of Physics, Faculty of Science, Arak University, P.O. Box: 3848177584, Arak, Iran</Affiliation>
				<Identifier Source="ORCID"></Identifier>
			</Author>
            			<Author>
                				<FirstName>Akbar</FirstName>
				<LastName>Zendehnam</LastName>
				<Affiliation>Department of Physics, Faculty of Science, Arak University, P.O. Box: 3848177584, Arak, Iran</Affiliation>
				<Identifier Source="ORCID"></Identifier>
			</Author>
            			<Author>
                				<FirstName>Seyedeh</FirstName>
				<LastName>Mehri Hamidi Sangdehi</LastName>
				<Affiliation>Laser and plasma Research Institute, Shahid Beheshti University (SBU), P.O. Box: 1983969411, Evin, Iran</Affiliation>
				<Identifier Source="ORCID">0000-0002-5298-2224</Identifier>
			</Author>
            			<Author>
                				<FirstName>Hamidreza</FirstName>
				<LastName>Ghomi Marzdashti</LastName>
				<Affiliation>Laser and plasma Research Institute, Shahid Beheshti University (SBU), P.O. Box: 1983969411, Evin, Iran</Affiliation>
				<Identifier Source="ORCID"></Identifier>
			</Author>
            		</AuthorList>
		<PublicationType>Journal Article</PublicationType>
		<History>
			<PubDate PubStatus="received">
				<Year>2023</Year>
				<Month>11</Month>
				<Day>17</Day>
			</PubDate>
		</History>
		<Abstract>AbstractIn this study, the influences of variations in the gas flow rate and incidence angles of argon cold atmospheric-pressure plasma jet on the morphology and absorption spectra of silver thin films (60 nm, 80 nm, and 100 nm film thickness) are investigated. To evaluate the surface morphology, atomic force microscopy (AFM) was employed on the silver thin film surface before and after plasma processing. To analyze the effect of plasma treatment on the grain size, the one-dimensional AFM surface profiles of Ag thin films are approximated using a Gaussian function. The absorbance of Ag thin films is measured in wavelength range of 190–1100 nm utilizing UV–Vis absorption spectrometer. Compared to the gas flow rates 0.5 standard litter per minute (SLM) and 2 SLM, surface treatment of Ag thin film with gas flow rate of 1 SLM increased the valley depth, the peak valley height, and the distance between two deepest valleys remarkably. A sequential argon plasma treatment (2-min plasma treatment perpendicular to surface was followed by 2-min plasma processing with non-perpendicular incidence angle of 60°) offers considerable improvement in the uniformity of grains and also changes shape of grains, especially the peak height (about 44 times higher than untreated sample) and area of grains (almost 136 times greater than untreated sample) which can be applicable for optical sensing technology.</Abstract>
		<ObjectList>
            			<Object Type="keyword">
				<Param Name="value">Absorption spectra</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">Surface morphology</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">Analysis of silver grain size</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">Gas flow rate</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">Gaussian function</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">Perpendicular incidence angle of argon cold atmospheric</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">Pressure plasma jet (APPJ)</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">Non</Param>
			</Object>
					</ObjectList>
	</Article>
		<Article>
		<Journal>
			<PublisherName>Journal of Theoretical and Applied Physics (JTAP)</PublisherName>
			<JournalTitle>Electrical behavior of graphene under temperature effect and survey of I–T curve</JournalTitle>
			<Issn></Issn>
			<Volume>Volume 13, 2019</Volume>
			<Issue>Issue 4, November and December 2019</Issue>
			<PubDate PubStatus="epublish">
                <Year>2023</Year>
                <Month>11</Month>
                <Day>17</Day>
			</PubDate>
		</Journal>
		<ArticleTitle>Electrical behavior of graphene under temperature effect and survey of I–T curve</ArticleTitle>
		<VernacularTitle></VernacularTitle>
		<FirstPage></FirstPage>
		<LastPage></LastPage>
		<ELocationID EIdType="doi">10.1007/s40094-019-00349-1</ELocationID>
		<Language>EN</Language>
		<AuthorList>
            			<Author>
                				<FirstName>Maryam</FirstName>
				<LastName>Haditale</LastName>
				<Affiliation>Department of Physics, University of Kurdistan, Sanandaj, Iran</Affiliation>
				<Identifier Source="ORCID"></Identifier>
			</Author>
            			<Author>
                				<FirstName>R.</FirstName>
				<LastName>S. Darian</LastName>
				<Affiliation>Department of Physics, Alzahra University, Tehran, Iran</Affiliation>
				<Identifier Source="ORCID"></Identifier>
			</Author>
            			<Author>
                				<FirstName>E.</FirstName>
				<LastName>Ghasemian Lemraski</LastName>
				<Affiliation>Department of Chemistry, Faculty of science, Ilam University, Ilam, Iran</Affiliation>
				<Identifier Source="ORCID"></Identifier>
			</Author>
            		</AuthorList>
		<PublicationType>Journal Article</PublicationType>
		<History>
			<PubDate PubStatus="received">
				<Year>2023</Year>
				<Month>11</Month>
				<Day>17</Day>
			</PubDate>
		</History>
		<Abstract>AbstractGraphene flakes were made from electrochemical exfoliation. To study graphene planes, different volumes of graphene solutions (1, 2, 4, and 7 ml) were sprayed on glass lamellae to get different graphene planes. I–V curve of all samples shows ohmic behavior with resistance in the order of kΩ which increases the slope of the I–V curve with increasing graphene planes (spray volume). The effect of temperature on all samples shows a clear jump in I–T curves. It is found that up to 150 °C current is almost constant, but after that current increases highly in the range of 1.8–10 times and resistance reduces sharply. Also, samples with lower graphene planes affected highly with temperature effect.</Abstract>
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            			<Object Type="keyword">
				<Param Name="value">Resistance</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">Graphene</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">– curve</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">Jump</Param>
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	</Article>
		<Article>
		<Journal>
			<PublisherName>Journal of Theoretical and Applied Physics (JTAP)</PublisherName>
			<JournalTitle>Effect of BN nanodots on the electronic properties of α- and β-graphyne sheets: a density functional theory study</JournalTitle>
			<Issn></Issn>
			<Volume>Volume 13, 2019</Volume>
			<Issue>Issue 4, November and December 2019</Issue>
			<PubDate PubStatus="epublish">
                <Year>2023</Year>
                <Month>11</Month>
                <Day>17</Day>
			</PubDate>
		</Journal>
		<ArticleTitle>Effect of BN nanodots on the electronic properties of α- and β-graphyne sheets: a density functional theory study</ArticleTitle>
		<VernacularTitle></VernacularTitle>
		<FirstPage></FirstPage>
		<LastPage></LastPage>
		<ELocationID EIdType="doi">10.1007/s40094-019-00353-5</ELocationID>
		<Language>EN</Language>
		<AuthorList>
            			<Author>
                				<FirstName>R.</FirstName>
				<LastName>Majidi</LastName>
				<Affiliation>Department of Physics, Shahid Rajaee Teacher Training University, Lavizan, Tehran, Iran</Affiliation>
				<Identifier Source="ORCID"></Identifier>
			</Author>
            			<Author>
                				<FirstName>H.</FirstName>
				<LastName>Eftekhari</LastName>
				<Affiliation>Department of Physics, Science and Research Branch, Islamic Azad University, Tehran, Iran</Affiliation>
				<Identifier Source="ORCID"></Identifier>
			</Author>
            			<Author>
                				<FirstName>H.</FirstName>
				<LastName>Bayat</LastName>
				<Affiliation>Department of Physics, Shahid Rajaee Teacher Training University, Lavizan, Tehran, Iran</Affiliation>
				<Identifier Source="ORCID"></Identifier>
			</Author>
            			<Author>
                				<FirstName>Kh.</FirstName>
				<LastName>Rahmani</LastName>
				<Affiliation>Department of Chemistry, Kabul Polytechnic University, Kabul, Afghanistan</Affiliation>
				<Identifier Source="ORCID"></Identifier>
			</Author>
            			<Author>
                				<FirstName>A.</FirstName>
				<LastName>M. Khairogli</LastName>
				<Affiliation>Department of Chemistry, Faryab University, Maymana, Faryab, Afghanistan</Affiliation>
				<Identifier Source="ORCID"></Identifier>
			</Author>
            		</AuthorList>
		<PublicationType>Journal Article</PublicationType>
		<History>
			<PubDate PubStatus="received">
				<Year>2023</Year>
				<Month>11</Month>
				<Day>17</Day>
			</PubDate>
		</History>
		<Abstract>AbstractThe effect of BN nanodots with hexagonal shape on the electronic properties of α- and β-graphyne sheets is investigated. The structural and electronic properties of α- and β-graphyne sheets doped with BN nanodots are studied by using density functional theory. The cohesive energies of the systems indicate all considered structures are thermally stable. It is found that hexagonal BN nanodots can effectively open the band gap in α- and β-graphyne sheets. It means BN nanodots change α- and β-graphyne sheets from semimetal to semiconductor. The BN nanodots with different sizes are considered. It is found that band gaps of the studied α- and β-graphyne sheets doped with BN nanodots increase with the increase in the size of BN nanodots. Hence, α- and β-graphyne sheets doped with BN nanodots are promising materials for use in nanoelectronic devices based on semiconductors.</Abstract>
		<ObjectList>
            			<Object Type="keyword">
				<Param Name="value">Density functional theory</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">Graphyne</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">Band gap modification</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">BN nanodot</Param>
			</Object>
					</ObjectList>
	</Article>
		<Article>
		<Journal>
			<PublisherName>Journal of Theoretical and Applied Physics (JTAP)</PublisherName>
			<JournalTitle>Effect of plasma oxidation parameters on physical properties of nanocrystalline nickel oxide thin films grown by two-step method: DC sputtering and plasma oxidation</JournalTitle>
			<Issn></Issn>
			<Volume>Volume 13, 2019</Volume>
			<Issue>Issue 4, November and December 2019</Issue>
			<PubDate PubStatus="epublish">
                <Year>2023</Year>
                <Month>11</Month>
                <Day>17</Day>
			</PubDate>
		</Journal>
		<ArticleTitle>Effect of plasma oxidation parameters on physical properties of nanocrystalline nickel oxide thin films grown by two-step method: DC sputtering and plasma oxidation</ArticleTitle>
		<VernacularTitle></VernacularTitle>
		<FirstPage></FirstPage>
		<LastPage></LastPage>
		<ELocationID EIdType="doi">10.1007/s40094-019-00350-8</ELocationID>
		<Language>EN</Language>
		<AuthorList>
            			<Author>
                				<FirstName>F.</FirstName>
				<LastName>Hajakbari</LastName>
				<Affiliation>Department of Physics, Karaj Branch, Islamic Azad University, Karaj, Iran</Affiliation>
				<Identifier Source="ORCID"></Identifier>
			</Author>
            			<Author>
                				<FirstName>S.</FirstName>
				<LastName>Rashvand</LastName>
				<Affiliation>Department of Physics, Karaj Branch, Islamic Azad University, Karaj, Iran</Affiliation>
				<Identifier Source="ORCID"></Identifier>
			</Author>
            			<Author>
                				<FirstName>A.</FirstName>
				<LastName>Hojabri</LastName>
				<Affiliation>Department of Physics, Karaj Branch, Islamic Azad University, Karaj, Iran</Affiliation>
				<Identifier Source="ORCID"></Identifier>
			</Author>
            		</AuthorList>
		<PublicationType>Journal Article</PublicationType>
		<History>
			<PubDate PubStatus="received">
				<Year>2023</Year>
				<Month>11</Month>
				<Day>17</Day>
			</PubDate>
		</History>
		<Abstract>AbstractNanocrystalline nickel oxide (NiO) thin films were successfully grown on quartz substrates by two-step method. In the first step, nickel films were deposited on quartz substrates by DC magnetron sputtering technique. Then, the plasma oxidation of nickel films was used for preparation of nickel oxide. The effect of DC plasma power and treatment time on the structural, morphological and optical properties of the NiO films were investigated by different analyses. XRD results indicated that the plasma powers effectively influenced the structure of films, and the best crystallinity was obtained for plasma power of 15 w and treatment time of 20 min. The XPS, RBS and EDS analysis confirmed the presence of Ni and O elements. The FESEM and AFM images showed a granular structure with spherical shapes of grains. The optical band gap of the films synthesized under different plasma oxidation conditions was also discussed.</Abstract>
		<ObjectList>
            			<Object Type="keyword">
				<Param Name="value">NiO</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">Plasma power</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">Plasma time</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">Plasma treatment</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">Thin Film</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">Nanocrystalline</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">DC sputtering</Param>
			</Object>
					</ObjectList>
	</Article>
		<Article>
		<Journal>
			<PublisherName>Journal of Theoretical and Applied Physics (JTAP)</PublisherName>
			<JournalTitle>Density functional theory study on the effect of Cu- and Na-substituted layers on spin-dependent transport and TMR in the Fe/ZnO/Fe MTJ</JournalTitle>
			<Issn></Issn>
			<Volume>Volume 13, 2019</Volume>
			<Issue>Issue 4, November and December 2019</Issue>
			<PubDate PubStatus="epublish">
                <Year>2023</Year>
                <Month>11</Month>
                <Day>17</Day>
			</PubDate>
		</Journal>
		<ArticleTitle>Density functional theory study on the effect of Cu- and Na-substituted layers on spin-dependent transport and TMR in the Fe/ZnO/Fe MTJ</ArticleTitle>
		<VernacularTitle></VernacularTitle>
		<FirstPage></FirstPage>
		<LastPage></LastPage>
		<ELocationID EIdType="doi">10.1007/s40094-019-00346-4</ELocationID>
		<Language>EN</Language>
		<AuthorList>
            			<Author>
                				<FirstName>Masoud</FirstName>
				<LastName>Ansarino</LastName>
				<Affiliation>Department of Physics, South Tehran Branch, Islamic Azad University, Tehran, Iran</Affiliation>
				<Identifier Source="ORCID">0000-0002-2311-5068</Identifier>
			</Author>
            		</AuthorList>
		<PublicationType>Journal Article</PublicationType>
		<History>
			<PubDate PubStatus="received">
				<Year>2023</Year>
				<Month>11</Month>
				<Day>17</Day>
			</PubDate>
		</History>
		<Abstract>AbstractUsing density functional theory, effects of Na- and Cu-substituted layers on the spin-dependent electronic transport properties of Fe/ZnO/Fe magnetic tunnel junction based on zinc oxide barrier tunnel, with rock-salt crystalline structure, have been studied. In zero-bias voltage, conductance and tunneling magneto-resistance (TMR) ratio of structures are calculated. It is showed that substituted layers in the pristine junction greatly affect conductance and TMR ratio of this junction. The results indicated that Cu-substituted layer with reducing conductance of pristine structure in the antiparallel alignment configuration, and increasing its conductance in the parallel alignment, leads to a large TMR ratio, up to 1800%. Due to the large conductance of pristine and Cu-substituted devices in the parallel alignment, these structures would be very beneficial for experimental applications that require the spin-polarized current.</Abstract>
		<ObjectList>
            			<Object Type="keyword">
				<Param Name="value">Nanostructure</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">Spintronics</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">MTJ</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">Rock</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">Salt ZnO</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">TMR</Param>
			</Object>
					</ObjectList>
	</Article>
		<Article>
		<Journal>
			<PublisherName>Journal of Theoretical and Applied Physics (JTAP)</PublisherName>
			<JournalTitle>Photon decaying in de Sitter universe</JournalTitle>
			<Issn></Issn>
			<Volume>Volume 13, 2019</Volume>
			<Issue>Issue 4, November and December 2019</Issue>
			<PubDate PubStatus="epublish">
                <Year>2023</Year>
                <Month>11</Month>
                <Day>17</Day>
			</PubDate>
		</Journal>
		<ArticleTitle>Photon decaying in de Sitter universe</ArticleTitle>
		<VernacularTitle></VernacularTitle>
		<FirstPage></FirstPage>
		<LastPage></LastPage>
		<ELocationID EIdType="doi">10.1007/s40094-019-00356-2</ELocationID>
		<Language>EN</Language>
		<AuthorList>
            			<Author>
                				<FirstName>Y.</FirstName>
				<LastName>Ahmadi</LastName>
				<Affiliation>Department of Physics, Razi University, Kermanshah, Iran</Affiliation>
				<Identifier Source="ORCID"></Identifier>
			</Author>
            			<Author>
                				<FirstName>M.</FirstName>
				<LastName>V. Takook</LastName>
				<Affiliation>Department of Physics, Kharazmi University, Tehran, Iran</Affiliation>
				<Identifier Source="ORCID">0000-0003-4038-3176</Identifier>
			</Author>
            		</AuthorList>
		<PublicationType>Journal Article</PublicationType>
		<History>
			<PubDate PubStatus="received">
				<Year>2023</Year>
				<Month>11</Month>
				<Day>17</Day>
			</PubDate>
		</History>
		<Abstract>AbstractThe interaction between three photons is studied in de Sitter ambient space formalism. As a special case, the half harmonic generator is considered, i.e., one photon decays to two same-energy photons. The scattering matrix elements are presented which define the indirect gravitational effect on quantum field theory. The null curvature limit of scattering matrix is obtained for comparing it with its Minkowskian counterpart. The Hamiltonian of this interaction, in Minkowski space–time, was presented by using the quantum vacuum fluctuation in the one-loop approximation.</Abstract>
		<ObjectList>
            			<Object Type="keyword">
				<Param Name="value">De Sitter space–time</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">Interaction</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">Quantum field theory</Param>
			</Object>
						<Object Type="keyword">
				<Param Name="value">Scattering matrix</Param>
			</Object>
					</ObjectList>
	</Article>
	</ArticleSet>
