Journal of Theoretical and Applied Physics (JTAP) Optical characterization of Cu3N thin film with Swanepoel method Volume 6 (2012) Issue 1, November and December 2012 2023 11 17 Optical characterization of Cu3N thin film with Swanepoel method 10.1186/2251-7235-6-13 EN Davoud Dorranian Plasma Physics Research Centre, Science and Research Branch, Islamic Azad University, Tehran, Iran 0000-0001-8855-7425 Laya Dejam Plasma Physics Research Center, Science and Research Branch, Islamic Azad University, Tehran, Iran 0000-0003-3925-1838 Gelareh Mosayebian Plasma Physics Research Center, Science and Research Branch, Islamic Azad University, Tehran, Iran 0000-0002-4926-8126 Journal Article 2023 11 17 bstractSwanepoel method is employed for spectroscopic determination of optical properties of Cu3N thin film using transmittance data. Investigated films have been deposited using reactive magnetron sputtering system. Deposition time was 9 to 21 min. Refractive index, absorption coefficient, and bandgap energy of the samples are determined. Thickness of the films is calculated by Swanepoel method, and result is compared with the thickness of the films measured by profilmeter. It is shown that Swanepoel method is a reliable way to calculate the optical constants of thin films when the transmittance spectrum of the film is influenced by wavelike patterns due to reflection of the probe beam from different interfaces.