Journal of Theoretical and Applied Physics (JTAP) 2D Plasmonic Micro-square Arrays based on Innovative Two-step Pattern Transfer and Plasma Treatment for High-efficiency Si Solar Cells Volume 18 (2024) Issue 3, May & June 2024 2024 05 21 2D Plasmonic Micro-square Arrays based on Innovative Two-step Pattern Transfer and Plasma Treatment for High-efficiency Si Solar Cells 10.57647/j.jtap.2024.1803.33 EN Neda Roostaei Magneto-plasmonic Lab, Laser and Plasma Research Institute, Shahid Beheshti University, Tehran, Iran 0000-0002-8253-0632 Seyedeh Mehri Hamidi Magneto-plasmonic Lab, Laser and Plasma Research Institute, Shahid Beheshti University, Tehran, Iran 0000-0002-5298-222 K.-W.-A. Chee National Education Center for Semiconductor Technology, Kyungpook National University, Daegu 41566, Republic of Korea Institute of Semiconductor Fusion Technology, Kyungpook National University, Daegu 415166, Republic of Korea School of Electronic and Electrical Engineering, Kyungpook National University, Daegu 415166, Republic of Korea 0000-0001-5659-2795 Journal Article 2024 05 21 Silicon (Si) photovoltaic cells and their production play a pivotal role in advancing energy utilization within the rapidly expanding solar industry, which serves as a critical driver in realizing global sustainability objectives and mitigating environmental repercussions associated with energy production.  Here, we introduce a novel two-step pattern transfer technique to successfully imprint a two-dimensional plasmonic micro-square periodic array onto an Si substrate, utilizing  Kapton® Tape and plasma technology.  Remarkably, this represents the first-ever application of flexible and stretchable Kapton® polyimide for pattern transfer onto Si.  The vacuum plasma treatment plays a pivotal role in significantly enhancing surface adhesion performance, thereby facilitating the efficient pattern transfer process.  As a result, the resulting microstructure exhibits exceptional performance as a plamonic broadband absorber in the visible region, making it a highly promising candidate for enhancing efficiency in Si-based solar cells.  To support our experimental findings, the finite-difference time domain method was employed for simulating the fabricated plasmonic structure and determining the electric field distribution.  The simulation results unequivocally affirm the robust and intense light trapping capabilities of the microstructure.  Moreover, our fabrication technique demonstrates the potential for achieving high-resolution microstructure through an innovative, straightforward, and cost-efficient approach.